The Computational Semiconductor Lithography
Photo by Dan Cristian Pădureț on Unsplash Computational lithography is a specialized field in the semiconductor manufacturing domain. It is used during lithography when advanced algorithmic models optimize the patterning and masking process. It is done by deforming the patterns to compensate for the physical and chemical effects naturally occurring in a standard flow. It utilizes the concept of inverse lithography to do so. Result: Accurate production of the desired chip patterns on the wafer to fabricate the complex advanced node silicon. Achieving such a complex and exact process on the go demands compute speed. It means that the equipment must either be equipped with high-performance XPUs to deliver a modeling approach or be able to offload and on load. In practice, the remote and distributed processing approach is better […]
